Resist stripping method and resist stripping apparatus

摘要

After the resist stripping liquid is supplied to the surface of the substrate which is being rotated at a first rotational speed, the rotational speed of the substrate is reduced from the first rotational speed to a second rotational speed with the supply of the resist stripping liquid to the surface of the substrate continued, thereby forming a liquid film by a mount of the resist stripping liquid on the surface of the substrate and then, maintaining a state where the liquid film is formed.