| 摘要 |
To provide a fluoropolymer suitable for use as a base polymer for resist materials for excimer lasers having a wavelength of 250 nm or shorter. A fluoropolymer having a monomer unit formed by cyclopolymerization of a fluorinated diene compound represented by the following formula (3), <?in-line-formulae description="In-line Formulae" end="lead"?>CF<SUB>2</SUB>-CFCF<SUB>2</SUB>-C(CF<SUB>3</SUB>)(R<SUP>5</SUP>)-CH<SUB>2</SUB>CH-CH<SUB>2 </SUB> (3) <?in-line-formulae description="In-line Formulae" end="tail"?> wherein R<SUP>5 </SUP>is either a hydroxyl group blocked by -CHR<SUP>7</SUP>-O-R<SUP>8 </SUP>or an organic group having the hydroxyl group, and R<SUP>8 </SUP>is a cyclic saturated hydrocarbon such as a cycloalkyl group which may have a substituent, or an organic group having the cyclic saturated hydrocarbon.
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