发明名称 AMORPHOUS OXIDE AND THIN FILM TRANSISTOR
摘要 <p>An amorphous oxide and a thin film transistor using the amorphous oxide. More specifically, an amorphous oxide having an electron carrier concentration of less than 10<18>/cm<3> and a thin film transistor using the amorphous oxide. The thin film transistor is provided with a source electrode (6), a drain electrode (5), a gate electrode (4), a gate insulating film (3) and a channel layer (2). As the channel layer (2), the amorphous oxide having an electron carrier concentration of less than 10<18>/cm<3> is used.</p>
申请公布号 WO2005088726(A1) 申请公布日期 2005.09.22
申请号 WO2005JP03273 申请日期 2005.02.28
申请人 JAPAN SCIENCE AND TECHNOLOGY AGENCY;HOSONO, HIDEO;HIRANO, MASAHIRO;OTA, HIROMICHI;KAMIYA, TOSHIO;NOMURA, KENJI 发明人 HOSONO, HIDEO;HIRANO, MASAHIRO;OTA, HIROMICHI;KAMIYA, TOSHIO;NOMURA, KENJI
分类号 G02F1/1345;G02F1/1368;H01L21/363;H01L21/77;H01L21/84;H01L29/786;(IPC1-7):H01L29/786;G02F1/134;G02F1/136 主分类号 G02F1/1345
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