发明名称 |
METHOD FOR ELIMINATING RESIDUE IN MOCVD |
摘要 |
PROBLEM TO BE SOLVED: To provide a method capable of easily eliminating a residue in a MOCVD device without flying them in all direction. SOLUTION: The method for eliminating the MOCVD residue eliminates the MOCVD residue by opening the MOCVD device (1) after adding water (C) to the MOCVD residue to make its moisture content not less than 15 mass%. Preferably, water (C) is added after filling an oxygen-containing gas within the MOCVD device (1) to make its pressure equal to the atmospheric pressure or more than it. The residue is easily eliminated without flying the residue in all direction. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005260119(A) |
申请公布日期 |
2005.09.22 |
申请号 |
JP20040072248 |
申请日期 |
2004.03.15 |
申请人 |
SUMITOMO CHEMICAL CO LTD |
发明人 |
UEDA KAZUMASA;TANAKA NORIAKI;OTA KIYOSHI |
分类号 |
C23C16/44;H01L21/205;H01L21/3065;(IPC1-7):H01L21/205;H01L21/306 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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