发明名称 METHOD OF CALIBRATING ELECTRON BEAM DETECTOR, ELECTRON BEAM EXPOSURE APPARATUS, AND ELECTRON BEAM EXPOSURE SYSTEM
摘要 PROBLEM TO BE SOLVED: To prevent the unevenness among patterns exposed by each electron beam exposure apparatus when conducting exposure using a plurality of electron beam exposure apparatuses. SOLUTION: A carry-in/out mechanism 5 for carrying in and out an electron beam detector 55 to be used as a reference is installed in an electron beam exposure apparatus 1. Using the electron beam detector 55 to be used as a reference, electron beam detectors 57 installed in respective electron beam exposure apparatuses 1 are calibrated. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005259963(A) 申请公布日期 2005.09.22
申请号 JP20040069068 申请日期 2004.03.11
申请人 TOKYO SEIMITSU CO LTD 发明人 KAWAMURA YUKISATO
分类号 G21K5/00;G03F7/20;G21K5/04;H01J37/244;H01J37/305;H01L21/027;(IPC1-7):H01L21/027 主分类号 G21K5/00
代理机构 代理人
主权项
地址