发明名称 |
METHOD OF CALIBRATING ELECTRON BEAM DETECTOR, ELECTRON BEAM EXPOSURE APPARATUS, AND ELECTRON BEAM EXPOSURE SYSTEM |
摘要 |
PROBLEM TO BE SOLVED: To prevent the unevenness among patterns exposed by each electron beam exposure apparatus when conducting exposure using a plurality of electron beam exposure apparatuses. SOLUTION: A carry-in/out mechanism 5 for carrying in and out an electron beam detector 55 to be used as a reference is installed in an electron beam exposure apparatus 1. Using the electron beam detector 55 to be used as a reference, electron beam detectors 57 installed in respective electron beam exposure apparatuses 1 are calibrated. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005259963(A) |
申请公布日期 |
2005.09.22 |
申请号 |
JP20040069068 |
申请日期 |
2004.03.11 |
申请人 |
TOKYO SEIMITSU CO LTD |
发明人 |
KAWAMURA YUKISATO |
分类号 |
G21K5/00;G03F7/20;G21K5/04;H01J37/244;H01J37/305;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
G21K5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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