发明名称 FIELD EFFECT TRANSISTOR AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a field effect transistor which can simply be manufactured, and represents field effect mobility and an on/off ratio since having excellent crystallinity and orientation. SOLUTION: This field effect transistor has an organic semiconductor layer. The organic semiconductor layer contains at least a porphyrin compound and maximum diffraction intensity I<SB>1</SB>in an area where a CuKαX ray diffraction Bragg angle (2θ) ranges from 9.9°to 10.4°is higher than maximum diffraction intensity I<SB>2</SB>in an area of 23.0°to 26.0°. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005259875(A) 申请公布日期 2005.09.22
申请号 JP20040067440 申请日期 2004.03.10
申请人 CANON INC 发明人 MIURA DAISUKE;NAKAYAMA HIROHARU;ONISHI TOSHINOBU;KUBOTA JUN;MASUMOTO AKANE;SUGIYAMA SATOMI
分类号 H01L51/05;H01L29/786;H01L51/00;(IPC1-7):H01L29/786 主分类号 H01L51/05
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