METHOD OF REMOVING RESIST, RESIST REMOVER INJECTION APPARATUS, AND RESIST REMOVING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a method of removing a resist effectively without increasing the number of processes by effectively using a remover to suppress an amount of a waste fluid. SOLUTION: The resist remover injection apparatus 10 includes a hot plate 3 as a gasification means in a longitudinal cylindrical hollow container 1, and is so structured as to allow the remover containing an organic base and an organic solvent to be introduced to the surface of the hot plate 3. The resist remover injection apparatus 10 gasifies the remover and injects the gasified remover toward the resist film formation surface 13 of a substrate 11 to remove the resist film. COPYRIGHT: (C)2005,JPO&NCIPI