发明名称 |
METHOD FOR FORMING TRANSPARENT CONDUCTIVE FILM, TRANSPARENT CONDUCTIVE FILM FORMED THEREBY, AND ARTICLE HAVING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a transparent conductive film which is highly safe, excellent in productivity and optical and electrical properties, and has an excellent limit curvature radius, and also to provide a transparent conductive film formed by the method, and an article having the transparent conductive film. SOLUTION: The method for forming the transparent conductive film on a substrate includes steps of: introducing a reactive gas in a discharge space under the atmospheric pressure or near that; rendering it in a plasma state; and exposing the substrate to the reactive gas in the plasma state. The reactive gas contains a reducing gas. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005259628(A) |
申请公布日期 |
2005.09.22 |
申请号 |
JP20040072143 |
申请日期 |
2004.03.15 |
申请人 |
KONICA MINOLTA HOLDINGS INC |
发明人 |
KIYOMURA TAKATOSHI;MAMIYA KANEO;TSUJI TOSHIO;SAITO ATSUSHI |
分类号 |
H01B5/14;H01B13/00;(IPC1-7):H01B13/00 |
主分类号 |
H01B5/14 |
代理机构 |
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主权项 |
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地址 |
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