Herstellung von Halbleiterschichten vorzugsweise aus Germanium oder Silizium,申请号DE1953S032719-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	Herstellung von Halbleiterschichten vorzugsweise aus Germanium oder Silizium
摘要
申请公布号	DE939100(C)	申请公布日期	1956.02.16
申请号	DE1953S032719	申请日期	1953.03.22
申请人	SIEMENS & HALSKE AKTIENGESELLSCHAFT, BERLIN UND MUENCHEN	发明人	MUENCHEN DIPL.-CHEM. GEORG ROSENBERGER,
分类号	C30B9/14;H01L21/18	主分类号	C30B9/14
代理机构		代理人
主权项
地址

您可能感兴趣的专利

METHOD TO DISTINGUISH EARTHING TROUBLE DUE TO INSULATOR STAIN

SEMICONDUCTOR MEMORY

MAGNETIC RECORDING/REPRODUCING APPARATUS

ILLUMINATED SWITCH

INFORMATION PROCESSING DEVICE

EDITING METHOD FOR CONTROL TABLE OF DISK RECORD CONTENT

MAGNETIC MEMORY APPARATUS

DISK REPRODUCING DEVICE

MEDIUM RECORDING/REPRODUCING DEVICE

DISK DRIVING DEVICE

MAGNETO-OPTICAL RECORDING ELEMENT

ANNEALING DEVICE FOR OPTICAL DISK

APPARATUS FOR RETRIEVING DATA TRACK

MAGNETIC RECORDING METHOD

ROTARY HEAD MECHANISM FOR TAPE RECORDER

DEVICE FOR RECORDING/REPRODUCING VIDEO SIGNAL

DEVICE FOR DRIVING MAGNETIC HEAD AND MAGNETO-OPTICAL RECORDER

ANTITHEFT DEVICE