发明名称 |
Method for fabricating fiber bragg grating elements and planar light circuits made thereof |
摘要 |
A method for fabricating Fiber Bragg Grating elements and planar light circuits made thereof. A mask having a predetermined pattern and a wafer are provided, wherein a light-guiding channel filled with light-guiding substance is formed on the wafer. A photoresist layer is then formed to cover the wafer. Magnification of a photolithography apparatus is adjusted to a first Mag., followed by transferring the pattern on the mask to the photoresist layer to form a first pattern. Light-guiding substance not covered by the photoresist layer is then removed so that the first pattern is transferred to the light-guiding channel. The light-guiding channel then forms a Fiber Bragg Grating element.
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申请公布号 |
US2005207701(A1) |
申请公布日期 |
2005.09.22 |
申请号 |
US20050134264 |
申请日期 |
2005.05.23 |
申请人 |
VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION |
发明人 |
KOH CHAO-MING;DOONG JIA-CHING;CHANG HSIEN-TZU;HUNG HAO-CHENG |
分类号 |
G02B6/02;G02B6/124;(IPC1-7):G02B6/34 |
主分类号 |
G02B6/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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