发明名称 Method for fabricating fiber bragg grating elements and planar light circuits made thereof
摘要 A method for fabricating Fiber Bragg Grating elements and planar light circuits made thereof. A mask having a predetermined pattern and a wafer are provided, wherein a light-guiding channel filled with light-guiding substance is formed on the wafer. A photoresist layer is then formed to cover the wafer. Magnification of a photolithography apparatus is adjusted to a first Mag., followed by transferring the pattern on the mask to the photoresist layer to form a first pattern. Light-guiding substance not covered by the photoresist layer is then removed so that the first pattern is transferred to the light-guiding channel. The light-guiding channel then forms a Fiber Bragg Grating element.
申请公布号 US2005207701(A1) 申请公布日期 2005.09.22
申请号 US20050134264 申请日期 2005.05.23
申请人 VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION 发明人 KOH CHAO-MING;DOONG JIA-CHING;CHANG HSIEN-TZU;HUNG HAO-CHENG
分类号 G02B6/02;G02B6/124;(IPC1-7):G02B6/34 主分类号 G02B6/02
代理机构 代理人
主权项
地址