发明名称 CVD SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a CVD system in which an organic metallic compound being a raw material can be vaporized into a large flow rate of a gaseous raw material and the organic metallic compound remaining in a vaporization chamber at the supply stoppage of the organic metallic compound can be removed in a short period of time from the vaporization chamber to enhance the responsiveness of the vaporization operation. SOLUTION: The CVD system is provided with the vaporization chamber having a slope, a heating mechanism for heating the slope and a structure movable by a moving mechanism. The structure is attached and detached to and from the slope along the flow of the organic metallic compound on the slope, and thereby, the organic metallic compound is condensed near the front end of the structure abutting on the slope and the organic metallic compound is discharged at an accelerated flow rate. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005256105(A) 申请公布日期 2005.09.22
申请号 JP20040070479 申请日期 2004.03.12
申请人 ANELVA CORP 发明人 AKIYAMA SUSUMU;SASAKI TOSHIAKI;SEKIGUCHI ATSUSHI;YAMADA KAZUTAKA
分类号 B01J7/02;C23C16/18;H01L21/28;H01L21/285;(IPC1-7):C23C16/18 主分类号 B01J7/02
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