发明名称 Substrate holder and exposure apparatus using same
摘要 A substrate holder for holding a substrate includes a holding-surface for holding the substrate, a first depression provided around the holding-surface, and a second depression provided around the first depression. The depth of the second depression is smaller than the depth of the first depression.
申请公布号 US2005207089(A1) 申请公布日期 2005.09.22
申请号 US20050074665 申请日期 2005.03.09
申请人 CANON KABUSHIKI KAISHA 发明人 ITO ATSUSHI
分类号 B23Q3/15;G03B27/58;G03F7/20;H01L21/68;H01L21/683;H02N13/00;(IPC1-7):G03B27/58 主分类号 B23Q3/15
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