BASE RESIN HAVING CYCLODODECYL PEDANT GROUP FOR CHEMICALLY AMPLIFIED PHOTORESIST AND CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION INCLUDING THE SAME,申请号KR20040017693-传众专利搜索

发明名称	BASE RESIN HAVING CYCLODODECYL PEDANT GROUP FOR CHEMICALLY AMPLIFIED PHOTORESIST AND CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION INCLUDING THE SAME
摘要
申请公布号	KR20050092593(A)	申请公布日期	2005.09.22
申请号	KR20040017693	申请日期	2004.03.16
申请人	DONGJIN SEMICHEM CO., LTD.	发明人	KIM, JUNG WOO;KIM, JONG YONG;LEE, JAE WOO;KIM, JAE HYUN
分类号	G03F7/039;(IPC1-7):G03F7/039	主分类号	G03F7/039
代理机构		代理人
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