| 摘要 |
PROBLEM TO BE SOLVED: To provide a charging method for semiconductor cleaning apparatus in which charging is conducted on the basis of the amount of removal of foreign matters, in the cleaning process wherein influence on the yield is large in the semiconductor device manufacturing process. SOLUTION: Charging is conducted on the basis of a means for removing foreign matters by cleaning the semiconductor devices with a semiconductor cleaning apparatus provided for the rental to customers, a means for generating numerical value in the amount of foreign matter, a means for transferring the apparatus information of the semiconductor cleaning apparatus and numerical value in the amount of foreign matter, and a numerical value in amount of foreign matter transferred. Accordingly, since charging is conducted on the basis of the number of foreign matter removed, the cash flow can be improved both in the device maker and cleaning apparatus maker and thereby stable management can be realized. COPYRIGHT: (C)2005,JPO&NCIPI
|
