| 摘要 |
PROBLEM TO BE SOLVED: To provide a ceramics heater for semiconductor manufacturing apparatus excellent in soaking property. SOLUTION: The ceramics heater for semiconductor manufacturing apparatus is configured in such a way that a spot facing hole is formed in an article mounting surface of a ceramics heater serving to mount an article to be heated and heating the same, and a supporter for supporting the article is inserted into the spot facing hole. An abutment surface of the supporter is spherical, and the dimension of the supporter is≤10 mm, and further the inside dimension of the spot facing hole is larger than the dimension of the supporter within the range of from 0.01 mm to 1.0 mm. Since the article is supported on a spherical surface, it is possible to obtain the ceramics heater for semiconductor manufacturing apparatus excellent in the uniformity of a temperature distribution. COPYRIGHT: (C)2005,JPO&NCIPI
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