发明名称 GAS BARRIER FILM AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a gas barrier film which enables the exhibition of a superior gas barrier performance when it is applied to a picture image displaying element such as a liquid crystal displaying element or an organic EL element or the like, its manufacturing method and the organic EL element formed by using the gas barrier film. SOLUTION: The gas barrier film has at least one inorganic layer and at least one organic layer alternatively formed on a substrate with a glass transition temperature of≥250°C and the said organic layer is formed by applying a liquid containing a polymer with a hydrogen boding group and a metal alkoxide and then by drying at a temperature of 150-350°C. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005254795(A) 申请公布日期 2005.09.22
申请号 JP20040287911 申请日期 2004.09.30
申请人 FUJI PHOTO FILM CO LTD 发明人 NARUSE HIDEAKI;SAKURAI SEIYA
分类号 H05B33/02;B32B9/00;H01L51/50;H05B33/04;H05B33/14;(IPC1-7):B32B9/00 主分类号 H05B33/02
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