发明名称 |
GAS BARRIER FILM AND ITS MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a gas barrier film which enables the exhibition of a superior gas barrier performance when it is applied to a picture image displaying element such as a liquid crystal displaying element or an organic EL element or the like, its manufacturing method and the organic EL element formed by using the gas barrier film. SOLUTION: The gas barrier film has at least one inorganic layer and at least one organic layer alternatively formed on a substrate with a glass transition temperature of≥250°C and the said organic layer is formed by applying a liquid containing a polymer with a hydrogen boding group and a metal alkoxide and then by drying at a temperature of 150-350°C. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005254795(A) |
申请公布日期 |
2005.09.22 |
申请号 |
JP20040287911 |
申请日期 |
2004.09.30 |
申请人 |
FUJI PHOTO FILM CO LTD |
发明人 |
NARUSE HIDEAKI;SAKURAI SEIYA |
分类号 |
H05B33/02;B32B9/00;H01L51/50;H05B33/04;H05B33/14;(IPC1-7):B32B9/00 |
主分类号 |
H05B33/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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