发明名称 Method of manufacturing dielectric layer and method of manufacturing liquid jet head
摘要 A method of manufacturing a dielectric film includes a coating step of coating sol made of an organic metal compound and forming a dielectric precursor film, a drying step of drying the dielectric precursor film, a degreasing step of degreasing the dielectric precursor film, and a baking step of baking the dielectric precursor film to form a dielectric film. The drying step includes a first drying step of drying the dielectric precursor film by heating the dielectric precursor film to a temperature lower than a boiling point of a solvent which is a main solvent of the sol and then holding the dielectric precursor film at the temperature for a predetermined period of time, and a second drying step of drying the dielectric precursor film further by reheating the dielectric precursor film and then holding the dielectric precursor film at the temperature for a predetermined period of time.
申请公布号 US2005208208(A1) 申请公布日期 2005.09.22
申请号 US20040998195 申请日期 2004.11.29
申请人 SEIKO EPSON CORPORATION 发明人 KURIKI AKIRA;KAZAMA HIRONOBU;SHINBO TOSHINAO;SUMI KOJI
分类号 B05D5/12;B41J2/16;C23C18/12;H01L41/22;(IPC1-7):B05D5/12 主分类号 B05D5/12
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