发明名称 Protection layers in micromirror array devices
摘要 To protect the structural layers from being eroded in the etching process, a protection layer is deposited on the exposed structural layers of the micromirror. The protection layer is deposited before etching and removed after etching.
申请公布号 US2005206993(A1) 申请公布日期 2005.09.22
申请号 US20050135699 申请日期 2005.05.24
申请人 DOAN JONATHAN;PATEL SATYADEV;HEUREUX PETER 发明人 DOAN JONATHAN;PATEL SATYADEV;HEUREUX PETER
分类号 G02B26/08;(IPC1-7):G02B26/00 主分类号 G02B26/08
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