Lighting system for a microlithography projection illuminating device comprises a lens, an optical aperture plate forming element in the region of the lens surface, and an optical field forming element

摘要

Lighting system comprises a lens (2), an optical aperture plate forming element (9) in the region of the lens surface or in an equivalent region of the lighting system, and an optical field forming element (8) in the region of the outlet aperture or in an equivalent region of the lighting system. Preferred Features: The optical field forming element is formed as a reflective optical grid element with a two dimensional grid structure or a two dimensional grid arrangement of reflective elements.