发明名称 PHOTOMASK STORAGE CONTAINER
摘要 <P>PROBLEM TO BE SOLVED: To provide a photomask storage container for transferring a photomask used for manufacturing a semiconductor integrated circuit and its substrate capable of making a complete sealed state of the photomask storage container and having an automatic opening or closing function. <P>SOLUTION: This photomask storage container has a structure constructed in such a way that a main body having main body pins on which a substrate is mounted and an O-ring on a connected plane and a lid member having lid pins for fixing the substrate are connected by a pair of connector pins, the stored substrate is fixed by the main body pins and the lid pins when the lid is closed over the main body, the connected portions between the main body and the lid closely contact through the O-ring and the inner side of the container is hermetic. This container has a filter part, an opening or closing part for suction or discharging air, a slide function for opening or closing the opening or closing part, a function for automatically opening or closing the lid, a battery function for a driving motor and a power supply for assisting the aforesaid functions, and a function showing a hermetic inner structure for performing an automatic opening or closing operation. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005255234(A) 申请公布日期 2005.09.22
申请号 JP20040072218 申请日期 2004.03.15
申请人 TOPPAN PRINTING CO LTD 发明人 TAKAHASHI RIICHI
分类号 B65D43/16;B65D43/26;B65D51/16;B65D51/26;B65D85/86;H01L21/027;H01L21/673;H01L21/68 主分类号 B65D43/16
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