发明名称 Programmable MOS device formed by hot carrier effect
摘要 A programmable metal-oxide-semiconductor (MOS) memory circuit and the method for programming same and disclosed. The circuit comprises a first N-type transistor having a gate region tied with a drain region and connectable to a first control voltage level, and a source region connected to a second voltage level; and a second N-type transistor having a gate region tied with a drain region and connectable to the first control voltage level, and a source region connected to the second voltage level, wherein the first and second control voltage levels are imposed to program either the first or second N-type transistor by causing a voltage difference between the drain region and the source region (Vds) and voltage difference between the gate region and the source region (Vgs) to be bigger than a predetermined threshold voltage to induce a hot carrier effect.
申请公布号 US2005207211(A1) 申请公布日期 2005.09.22
申请号 US20040803785 申请日期 2004.03.17
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 CHEN CHUNG-HUI
分类号 G11C11/00;G11C11/401;G11C11/4063;G11C16/12;(IPC1-7):G11C11/00 主分类号 G11C11/00
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