发明名称 |
Positive resist composition for immersion exposure and pattern-forming method using the same |
摘要 |
A positive resist composition for immersion exposure comprises: (A) a resin containing at least one repeating unit having a fluorine atom and increasing a solubility of the resin in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with one of an actinic ray and radiation.
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申请公布号 |
US2005208419(A1) |
申请公布日期 |
2005.09.22 |
申请号 |
US20050077012 |
申请日期 |
2005.03.11 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
INABE HARUKI;KANNA SHINICHI;KANDA HIROMI |
分类号 |
G03F7/004;G03F7/039;G03F7/20;(IPC1-7):G03C1/492 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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