| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition suitable for direct recording by a semiconductor laser, a YAG laser, etc., having high sensitivity, and not requiring post-exposure-baking. <P>SOLUTION: The positive photosensitive composition showing a difference in solubility in an alkali developer as between an exposed portion and a non-exposed portion, which comprises, as essential components inducing the difference in solubility, (a) a light-absorbing dye having an absorption band covering a part or whole of a wavelength region of from 650 nm to 1.06 μm and (b) a novolac resin and/or a polyvinyl phenol resin as a high molecular compound, and further comprises (c) a solubility-suppressing agent, and the composition is configured such that it has no photosensitivity to ultraviolet light. The solubility-suppressing agent reduces the dissolution rate, in the alkali developer, of a blend comprising a light-absorbing dye of component (a) and a high molecular compound of component (b). <P>COPYRIGHT: (C)2005,JPO&NCIPI |
