| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inexpensive mirror for EUV light, capable of efficient dissipation of the heat caused using irradiation of beams, an illumination optical device, and an exposure device using it. <P>SOLUTION: The oblique incidence type mirror for reflecting EUV light with a wavelength of 60 nm or shorter is provided with a substrate and a reflecting film. For the reflectivity in the EUV light, the reflectivity of the material constituting the reflective film is higher than that of the material constituting the substrate; whereas, for the thermal conductivity, the thermal conductivity of the material constituting the substrate is higher than that of the material constituting the reflecting film. In this way, the oblique incidence type mirror for reflecting the EUV light can be produced with high efficiency in heat dissipation and at a low cost. Moreover, it can prevent changes in the shape of the mirror surface caused due to heat, as much as possible. The illumination optical device and the exposure device mounting it can be used stably over a long time, and with little change in the illumination conditions and exposure conditions, even if they are used over a long term. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
