发明名称 SUBSTRATE RETAINER, STAGE DEVICE, EXPOSING DEVICE AND EXPOSING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To prevent a leak of a liquid without causing a reduction of a measuring accuracy. <P>SOLUTION: There are provided a holder PH for holding a substrate P on a retaining face 34A, and a drive mechanism 70 for driving the substrate P in a direction substantially perpendicular to the retaining face 34A through an opening 71 formed on the retaining face 34A. There are further provided a moving part 76 movable in the perpendicular direction accompanied by driving the drive mechanism 70, and a surrounding member 76 surrounding the opening 71 from the lower side of the retaining face 34A. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005259870(A) 申请公布日期 2005.09.22
申请号 JP20040067347 申请日期 2004.03.10
申请人 NIKON CORP 发明人 TAKAIWA HIROAKI
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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