发明名称 Balanced positioning system for use in lithographic apparatus
摘要 A balanced positioning apparatus comprises a balance mass which is supported so as to be moveable in the three degrees of freedom, such as X and Y translation and rotation about the Z-axis. Drive forces in these degrees of freedom act directly between the positioning body and the balance mass. Reaction forces arising from positioning movements result in corresponding movement of the balance mass and all reaction force are kept within the balanced positioning system. The balance mass may be a rectangular balance frame having the stators of two linear motors forming the uprights of an H-drive mounted on opposite sides. The cross-piece of the H-drive spans the frame and the positioned object is positioned within the central opening of the frame.
申请公布号 US2005206865(A1) 申请公布日期 2005.09.22
申请号 US20020322800 申请日期 2002.12.19
申请人 发明人 KWAN YIM BUN P.;VAN DE WIEL WILHELMUS JACOBUS T.P.
分类号 G12B5/00;G03F7/20;H01L21/027;(IPC1-7):G03B27/42 主分类号 G12B5/00
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