发明名称 Pattering substrate and cell culture substrate
摘要 The present invention intends primarily to provide such as a cell culture patterning substrate that is used to adhere a cell in a highly precise pattern on a base material to culture and a cell culture substrate on which the cell is adhered in a high precision pattern. In order to achieve the above-mentioned object, the present invention provides a patterning substrate having a base material and a cell culture patterning layer that is formed on the base material and at least contains a photocatalyst and a cell adhesion-inhibiting material that has cell adhesion-inhibiting properties that inhibit the cell from adhering and is decomposed or modified owing to an action of the photocatalyst in combination with energy irradiation.
申请公布号 US2005208656(A1) 申请公布日期 2005.09.22
申请号 US20040001203 申请日期 2004.11.30
申请人 MIYAKE HIDEYUKI;HATTORI HIDESHI;KOBAYASHI HIRONORI 发明人 MIYAKE HIDEYUKI;HATTORI HIDESHI;KOBAYASHI HIRONORI
分类号 C12M3/00;A61L27/00;C12N5/00;C12N5/02;(IPC1-7):C12N5/02 主分类号 C12M3/00
代理机构 代理人
主权项
地址