发明名称 |
Pattering substrate and cell culture substrate |
摘要 |
The present invention intends primarily to provide such as a cell culture patterning substrate that is used to adhere a cell in a highly precise pattern on a base material to culture and a cell culture substrate on which the cell is adhered in a high precision pattern. In order to achieve the above-mentioned object, the present invention provides a patterning substrate having a base material and a cell culture patterning layer that is formed on the base material and at least contains a photocatalyst and a cell adhesion-inhibiting material that has cell adhesion-inhibiting properties that inhibit the cell from adhering and is decomposed or modified owing to an action of the photocatalyst in combination with energy irradiation.
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申请公布号 |
US2005208656(A1) |
申请公布日期 |
2005.09.22 |
申请号 |
US20040001203 |
申请日期 |
2004.11.30 |
申请人 |
MIYAKE HIDEYUKI;HATTORI HIDESHI;KOBAYASHI HIRONORI |
发明人 |
MIYAKE HIDEYUKI;HATTORI HIDESHI;KOBAYASHI HIRONORI |
分类号 |
C12M3/00;A61L27/00;C12N5/00;C12N5/02;(IPC1-7):C12N5/02 |
主分类号 |
C12M3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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