发明名称 APPARATUS FOR PROCESSING AN OBJECT WITH HIGH POSITION ACCURACY
摘要 <p>A apparatus processes an object ( 19 ), such as a semi-conductor wafer at accurately controlled positions. The object ( 19 ) is supported by a working platform ( 12 ) that is moveable along a path. A suspension actuator part ( 14 ) attached to the working platform ( 12 ), contains a soft magnetic core ( 24 ) with poles facing the surface of a soft magnetic element ( 34 ) on the support structure along the path and a winding ( 20 ) for application of a current to generate a magnetic field that runs through the core ( 24 ) v the poles and returns via the soft magnetic element ( 34 ). A sensor ( 17 ) senses a measured position of the suspension actuator part ( 14 ) relative to the position reference element ( 16 ). A control circuit comprises an outer control circuit ( 40 ) and an inner control circuit ( 42 ). The outer control circuit ( 40 ) receives a sensing result and determines force set point information to regulate the measured position of the actuator part ( 14 ) to a required value. The inner control circuit ( 42 ) receives the force set point information and controls the current to realize a force between the actuator part ( 14 ) and the support structure ( 10 ) according to the force set point information.</p>
申请公布号 EP1576716(A2) 申请公布日期 2005.09.21
申请号 EP20030780424 申请日期 2003.12.15
申请人 KONINKLIJKE PHILIPS ELECTRONICS N.V. 发明人 VAN EIJK, JAN;BAKKER, ARJAN, F.;BOS, DENNIS, E.;COMPTER, JOHAN, C.;DE KLERK, ANGELO, C., P.;ROES, FRANCISCUS, M.;VROOMEN, HUBERT, G., J., J., A.;WARMERDAM, THOMAS, P., H.
分类号 F16C39/06;G03F7/20;G03F9/00;H01J37/20;H01J37/317;H01L21/68;H02K11/00;H02K41/03;(IPC1-7):H02K41/03 主分类号 F16C39/06
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