| 摘要 |
An apparatus for manufacturing a semiconductor device, comprising a process chamber which holds a substrate to be subjected to a prescribed process, a gas inlet pipe which introduces a process gas into the process chamber, a gas outlet pipe which discharges the gas from the process chamber to outside the process chamber, component-measuring devices which measure components of the gas in the process chamber or at least two different gases, concentration-measuring devices which measure concentration of each component of the gas in the process chamber, or the concentration of each component of at least two different gases, and a control device which adjusts the components of the process gas, the concentration of each component of the process gas and an atmosphere in the process chamber, on the basis of values measured by the composition-measuring device and concentration-measuring device.
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