发明名称 Catoptric projection optical system, exposure apparatus and device fabrication method using same
摘要 A catoptric projection optical system for projecting a pattern on an object surface onto an image surface and for serving as an imaging system that forms an intermediate image includes first, second, third and fourth mirrors serving substantially as a coaxial system so as to sequentially reflect light from an object side to an image side, and being arranged so that light from the object surface to the first mirror may intersect light from the second mirror to the third mirror.
申请公布号 US6947210(B2) 申请公布日期 2005.09.20
申请号 US20030359868 申请日期 2003.02.06
申请人 CANON KABUSHIKI KAISHA 发明人 TERASAWA CHIAKI
分类号 G02B17/00;G02B17/06;G02B27/18;G03F7/20;H01L21/027;(IPC1-7):G02B17/00 主分类号 G02B17/00
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