| 摘要 |
An apparatus for generation of a linear arc discharge for plasma processing, particularly for surface processing of solid substrates, installed in a reactor held at gas pressures below 5 x 104 Pa and powered by a generator of alternating current and/or pulsing power (10), and including: at least one pair of a first electrode plate (1) and a second electrode plate (2) placed opposite to each other at a distance exceeding 0.4 mm and connected to the same pole of the generator which has a counter pole connected to a counter electrode (3), a magnetic field produced by magnets (4) for development of a linear hot zone (5) on the first electrode plate and a linear hot zone (6) on the second electrode plate, having a component of at least 10-3 Tesla across the slit between these electrode plates, an ionized environment (7) containing a working gas (8) involved between the electrode plates and having electrical contact with the electrode plates where an arc discharge (9) is generated and with the counter electrode.
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