发明名称 Deterioration resistant chambers for inductively coupled plasma production
摘要 In one aspect of the invention is a method to construct plasma chambers with improved wall resistance to deterioration. In one embodiment of the invention, a chamber is made of an aluminum alloy having low concentrations of elements that form non-soluble, intermetallic particles to address coating/substrate issues, has swaged-in cooling tubes to reduce thermal stress by improving thermal resistance, and has a plurality of dielectric gaps to decrease ion bombardment.
申请公布号 US6946063(B1) 申请公布日期 2005.09.20
申请号 US20030374306 申请日期 2003.02.25
申请人 ADVANCED ENERGY INDUSTRIES, INC. 发明人 GONZALEZ JUAN JOSE;DILLON STEVE;SHABALIN ANDREW;MAUCK JUSTIN;TOMASEL FERNANDO GUSTAVO
分类号 B21C37/15;B21D53/08;B21J9/06;B23P11/00;F28F1/22;(IPC1-7):C23C14/34 主分类号 B21C37/15
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