发明名称 |
Deterioration resistant chambers for inductively coupled plasma production |
摘要 |
In one aspect of the invention is a method to construct plasma chambers with improved wall resistance to deterioration. In one embodiment of the invention, a chamber is made of an aluminum alloy having low concentrations of elements that form non-soluble, intermetallic particles to address coating/substrate issues, has swaged-in cooling tubes to reduce thermal stress by improving thermal resistance, and has a plurality of dielectric gaps to decrease ion bombardment.
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申请公布号 |
US6946063(B1) |
申请公布日期 |
2005.09.20 |
申请号 |
US20030374306 |
申请日期 |
2003.02.25 |
申请人 |
ADVANCED ENERGY INDUSTRIES, INC. |
发明人 |
GONZALEZ JUAN JOSE;DILLON STEVE;SHABALIN ANDREW;MAUCK JUSTIN;TOMASEL FERNANDO GUSTAVO |
分类号 |
B21C37/15;B21D53/08;B21J9/06;B23P11/00;F28F1/22;(IPC1-7):C23C14/34 |
主分类号 |
B21C37/15 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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