发明名称 Method and apparatus for monitoring molecular contamination of critical surfaces using coated SAWS
摘要 A molecular contamination monitor for monitoring molecular contamination on a surface of a subject surface susceptible to degradation by a molecular contaminant. The monitor includes a surface acoustic wave (SAW) device having a SAW measurement surface coated with a material that is equivalent to the subject material with respect to spontaneous contamination by a contaminant. In the preferred embodiment, the coating comprises the same material as the subject surface or a material that interacts chemically with the contaminant in an equivalent manner to the subject surface. Exemplary coatings include: photoresist, copper, silver, gold, platinum, titanium, tungsten, aluminum, nickel, metal oxides, stearic acid, silicon, gallium arsenide, gallium nitride, germanium, silicon germanium, silicon dioxide, silicon nitride, and glass. Exemplary coating methods include sputtering, CVD, ALD and misted deposition.
申请公布号 US6945090(B2) 申请公布日期 2005.09.20
申请号 US20020178699 申请日期 2002.06.24
申请人 PARTICLE MEASURING SYSTEMS, INC. 发明人 RODIER DANIEL
分类号 G01N29/00;G01N7/00;G01N15/00;G01N27/02;G01N29/02;G01N29/036;(IPC1-7):G01N29/02 主分类号 G01N29/00
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