摘要 |
A molecular contamination monitor for monitoring molecular contamination on a surface of a subject surface susceptible to degradation by a molecular contaminant. The monitor includes a surface acoustic wave (SAW) device having a SAW measurement surface coated with a material that is equivalent to the subject material with respect to spontaneous contamination by a contaminant. In the preferred embodiment, the coating comprises the same material as the subject surface or a material that interacts chemically with the contaminant in an equivalent manner to the subject surface. Exemplary coatings include: photoresist, copper, silver, gold, platinum, titanium, tungsten, aluminum, nickel, metal oxides, stearic acid, silicon, gallium arsenide, gallium nitride, germanium, silicon germanium, silicon dioxide, silicon nitride, and glass. Exemplary coating methods include sputtering, CVD, ALD and misted deposition.
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