发明名称 |
Method and apparatus for forming high surface area material films and membranes |
摘要 |
The present invention discloses a method and apparatus for producing high surface area material films and membranes on substrates. In one application, patterns of spikes or bristles are produced on wafers and transferred to films, such as conductive polymer or metal films, by using repetitive and inexpensive processes, such as electroplating and embossing. Such a technique provides low cost, high surface area materials and allows reuse of expensive patterned silicon. Membranes with high surface area are extremely valuable in fuel cells since the power density is generally proportional to the surface area and the patterns may be used to cast inexpensive fuel cell electrodes.
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申请公布号 |
US6946362(B2) |
申请公布日期 |
2005.09.20 |
申请号 |
US20020236429 |
申请日期 |
2002.09.06 |
申请人 |
HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. |
发明人 |
GORE MAKARAND P.;DUNFIELD JOHN STEPHEN |
分类号 |
H01M4/90;B29C33/38;B29C33/56;C23C14/00;C25D1/10;H01M4/04;H01M4/86;H01M4/88;(IPC1-7):H01L21/30;H01L21/46 |
主分类号 |
H01M4/90 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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