发明名称 Method for measuring product parameters of components formed on a wafer and device for performing the method
摘要 A measuring arrangement for measuring product parameters of a component in the epitaxial layer ( 28 ) of a wafer comprises measuring probe ( 3 ) on whose contact side ( 23 ) a recess ( 24 ) is installed, into which an electrolyte can be poured. The electrolyte produces an electrical connection between a contact body ( 11 ), which is charged with a signal from a pulsed-current source, and the surface ( 22 ) of the wafer ( 2 ). A detector ( 16 ) serves for detecting the light which is emitted by the component.
申请公布号 US6946864(B2) 申请公布日期 2005.09.20
申请号 US20020078146 申请日期 2002.02.19
申请人 OSRAM GMBH 发明人 GRAMANN WOLFGANG;OBERSCHMID RAIMUND;SPAETH WERNER;TEICH WOLFGANG
分类号 G01N21/66;(IPC1-7):G01R31/28 主分类号 G01N21/66
代理机构 代理人
主权项
地址