发明名称 |
Method for measuring product parameters of components formed on a wafer and device for performing the method |
摘要 |
A measuring arrangement for measuring product parameters of a component in the epitaxial layer ( 28 ) of a wafer comprises measuring probe ( 3 ) on whose contact side ( 23 ) a recess ( 24 ) is installed, into which an electrolyte can be poured. The electrolyte produces an electrical connection between a contact body ( 11 ), which is charged with a signal from a pulsed-current source, and the surface ( 22 ) of the wafer ( 2 ). A detector ( 16 ) serves for detecting the light which is emitted by the component.
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申请公布号 |
US6946864(B2) |
申请公布日期 |
2005.09.20 |
申请号 |
US20020078146 |
申请日期 |
2002.02.19 |
申请人 |
OSRAM GMBH |
发明人 |
GRAMANN WOLFGANG;OBERSCHMID RAIMUND;SPAETH WERNER;TEICH WOLFGANG |
分类号 |
G01N21/66;(IPC1-7):G01R31/28 |
主分类号 |
G01N21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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