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发明名称
铁电体膜、铁电记忆体、及压电元件
摘要
本发明乃有关铁电体膜、铁电记忆体、及压电元件,其课题乃提供可得高可靠性之铁电体装置之铁电体膜,其解决手段乃以ABO3所表示之钙钛矿构造铁电体所构成之铁电体膜中,做为A侧添加离子,包含 Si^2+、Ge^2+以及Sn^2+中最少一种以上,做为B侧添加离子至少包含Nb^5+。
申请公布号
TW200531261
申请公布日期
2005.09.16
申请号
TW094101569
申请日期
2005.01.19
申请人
精工爱普生股份有限公司
发明人
木岛健;宫泽弘;滨田泰彰
分类号
H01L27/10
主分类号
H01L27/10
代理机构
代理人
林志刚
主权项
地址
日本
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