发明名称 VALVE APPARATUS AND HEAT TREATMENT SYSTEM
摘要 Two bypasses (32, 33) are formed in the valve box (21) of a main valve (18) provided in the piping (13) of the exhaust system (12) of a heat treatment furnace (1). Each bypath (32, 33) is opened/closed by an auxiliary valve (30, 31) fixed to the valve box (21). One auxiliary valve (31) is arranged as a flow regulating valve. The main valve (18) is secured to the housing (14) of a heat treatment system by means of bolts and nuts using a securing plate (54) provided in the main valve (18). Piping section of the exhaust system can be simplified and efficiency of the maintenance work of the heat treatment system is enhanced.
申请公布号 KR20050091914(A) 申请公布日期 2005.09.16
申请号 KR20037013404 申请日期 2003.10.13
申请人 TOKYO ELECTRON LIMITED 发明人 MATSUURA HIROYUKI;KOIKE SATORU
分类号 H01L21/205;H01L21/22;H01L21/31;(IPC1-7):H01L21/205 主分类号 H01L21/205
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