发明名称 Semiconductor device and method for manufacturing semiconductor device
摘要 A semiconductor device comprising: a semiconductor layer formed on a dielectric; a gate electrode formed on the semiconductor layer; a compound metal layer disposed on a source side in a manner to contact a body region of the semiconductor layer; and an impurity diffusion layer disposed on a drain side in a manner to contact the body region of the semiconductor layer.
申请公布号 US2005199965(A1) 申请公布日期 2005.09.15
申请号 US20050079258 申请日期 2005.03.14
申请人 KATO JURI;TAKIZAWA TERUO 发明人 KATO JURI;TAKIZAWA TERUO
分类号 H01L29/872;H01L21/336;H01L21/8238;H01L29/47;H01L29/76;H01L29/786;(IPC1-7):H01L29/76;H01L21/823 主分类号 H01L29/872
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