| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma generating method and a plasma generating device capable of quickly realizing an intended reaction at a low cost, hardly generating malfunction of power source. <P>SOLUTION: A silicon base plate 2 is put on a base plate electrode 1, and a shower electrode 4 and a shower plate 5 are formed on an opposing electrode 3. Gas is supplied from a gas supplying device 7 to a gas gathering part 9 through a piping 8, and discharged through shower holes 6 on the base plate 2. A plasma is generated by supplying a high frequency power of 13.65 MHz on the base plate electrode from a high frequency power source 10. An ultrasonic vibrator 11 as a vibrator is connected to the base plate electrode 1 through a horn 12, and a matching unit 13 is connected to the base plate electrode 1. By operating the vibrator 11, the base plate electrode 1 and the base plate 2 moves mechanically against the opposing electrode 3 in parallel with each other. Surface reformation (improvement of wettability) of the base plate 2 is carried out by the plasma irradiation. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
