| 摘要 |
PROBLEM TO BE SOLVED: To provide film deposition process and equipment for depositing a desired film on a sample substrate in which a film can be deposited under various conditions at a low cost in a short time. SOLUTION: In the film deposition process and equipment for depositing a film on a sample substrate only at the exposed part by covering the sample substrate with a focus ring partially provided with an opening, a film can be deposited only at an arbitrary part of the sample substrate by rotating the focus ring at an arbitrary rotational angle, and a film can be deposited at a plurality of parts on one sample substrate under different deposition conditions by repeating rotation of the focus ring and film deposition a plurality of times. COPYRIGHT: (C)2005,JPO&NCIPI
|
