| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an immersion exposure device adapted to perform a measurement processing, using an interferometer system, enabling implementation of properly conducting accurate exposure processing. <P>SOLUTION: The exposure device EX is adapted to expose a substrate P via a liquid LQ. The exposure equipment is provided with a substrate stage PST which can hold the substrate P, an interferometer system 43 which projects a measuring light onto a reflection plane formed on a moving mirror on the substrate stage PST, receives the reflected light and measures position information about the substrate stage PST, and a memory MRY that stores error information about the reflection plane, under the conditions where the liquid LQ is supplied on the substrate stage PST as first information. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
