发明名称 MEASURING APPARATUS AND METHOD
摘要 PROBLEM TO BE SOLVED: To measure by using an optical type measuring apparatus, even in a sparse pattern of low pattern density. SOLUTION: The measuring apparatus comprises a light source for oscillating measuring light, for radiating to a sample board and a stage for mounting the sample substrate on an optical spot where the measuring light enters. Measurement is conducted, when measuring patterns on the sample board by the optical type measuring apparatus, under the condition that at least a required number of patterns to obtain the interference light by the irradiation of the measuring light, from among a plurality of patterns formed on the sample substrate, are adjusted at an angle that the patterns are contained within an optical spot. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005249734(A) 申请公布日期 2005.09.15
申请号 JP20040064402 申请日期 2004.03.08
申请人 SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC 发明人 HAYASHI MANABU
分类号 G01B11/24;H01L21/66;(IPC1-7):G01B11/24 主分类号 G01B11/24
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