发明名称 VACUUM PROCESSOR
摘要 PROBLEM TO BE SOLVED: To provide a small-sized vacuum processor with a small installation area. SOLUTION: This vacuum processor is provided with a vacuum vessel having inside a treatment chamber where the pressure is reduced to form plasma used for the treatment of samples, a bed portion arranged below the vacuum vessel and containing a device supplying a power or an electrical signal used for the treatment inside the vacuum vessel, and a conveying room connected to the vacuum vessel and having a carrier for carrying the samples inside, and is characterized in that a connector portion to which the processor connected drivably is fixed by facing a lower part of the conveying room of the bed portion is provided, and the connection of the bed portion at the connector portion is attached and detached, and is constituted so as to be detachable from the vacuum processor. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005246350(A) 申请公布日期 2005.09.15
申请号 JP20040064618 申请日期 2004.03.08
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 OOHIRAHARA YUUZOU;UEDA AKIRA
分类号 B01J3/00;C23C16/00;H01L21/02;H01L21/3065;H01L21/677;H01L21/68;(IPC1-7):B01J3/00;H01L21/306 主分类号 B01J3/00
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