发明名称 High rate deposition of titanium dioxide
摘要 There is provided a structure. The structure comprises a substrate, and a titanium oxide layer disposed over the substrate. There is also provided a method of forming a titanium oxide coating on a substrate. The method includes generating a plasma; providing a first reactant, comprising titanium, and a second reactant, comprising oxygen, into the plasma stream extending to the substrate; and forming the titanium oxide coating on the substrate.
申请公布号 US2005202250(A1) 申请公布日期 2005.09.15
申请号 US20050125208 申请日期 2005.05.10
申请人 GENERAL ELECTRIC COMPANY 发明人 IACOVANGELO CHARLES;GILLETTE GREGORY R.;SCHAEPKENS MARC
分类号 C23C16/40;C23C16/513;(IPC1-7):B32B9/00 主分类号 C23C16/40
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