发明名称 Optical element wafer and method for manufacturing the same, burn-in apparatus for optical element wafer, and burn-in method for optical element wafer
摘要 To provide an optical element wafer that can lower the cost of a burn-in step for the optical element wafer. An optical element wafer in accordance with the present invention includes a substrate, a plurality of optical elements formed above the substrate, and a burn-in electrode formed above the substrate, in an area different from an element forming area where the optical elements are formed, wherein the optical element includes a first semiconductor layer formed above the substrate, an active layer formed above the first semiconductor layer, a second semiconductor layer formed above the active layer, a first electrode that is electrically connected to the first semiconductor layer, and a second electrode that is electrically connected to the second semiconductor layer. Each of the optical elements shares the first semiconductor layer, and the burn-in electrode is electrically connected to the first semiconductor layer.
申请公布号 US2005201763(A1) 申请公布日期 2005.09.15
申请号 US20050050681 申请日期 2005.02.07
申请人 SEIKO EPSON CORPORATION 发明人 KANEKO TSUYOSHI
分类号 H01L21/66;H01L27/15;H01L29/26;H01L31/10;H01L33/06;H01L33/30;H01L33/36;H01S5/183;(IPC1-7):H01L27/15 主分类号 H01L21/66
代理机构 代理人
主权项
地址