发明名称 BASE MATERIAL OF POLISHING CARRIER AND ITS MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a base material of a polishing carrier, which is easily separated from a polishing surface when the base material is mounted and dismounted on a polishing apparatus. <P>SOLUTION: A plurality of prepreg sheets 14, which are made by impregnating thermosetting resin into the base material and by drying them, are overlapped and are formed by heating and pressing them. Embossed undulations are formed on the surface of the prepreg sheets. The height of the undulations is within a range from 10 to 50 &mu;m. As a result, when the polishing carrier 1 formed with this polishing carrier base material on the polishing apparatus is separated from the base material after workpieces have been polished by mounting the polishing carrier 1, the polishing carrier 1 is easily separated from the polishing surface by preventing the close contact of the surface of the polishing carrier 1 with the polishing surface. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005246574(A) 申请公布日期 2005.09.15
申请号 JP20040062908 申请日期 2004.03.05
申请人 MATSUSHITA ELECTRIC WORKS LTD 发明人 ISHIDA TAKEHIRO;NAKAMURA YOSHIHIKO
分类号 B24B37/27;B24B37/28;B24B41/06;H01L21/304 主分类号 B24B37/27
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