发明名称 POLISHING DEVICE, POLISHING METHOD, OPTICAL ELEMENT AND EXPOSURE DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a polishing device capable of performing high precision polishing by stabilizing the flow state of a polishing fluid when jetting gas from a spray nozzle, to allow the stable polishing fluid to collide with a polished object, and to provide a polishing method, an optical element and an exposure device. SOLUTION: In this polishing device 10, a polished object is dipped in the polishing fluid 3 in a polishing fluid vessel 11, and the gas 2 is jetted to the surface of the polished object 4 from the spray nozzle 1 to polish the surface. The whole spray nozzle 1 is formed of a water repellent material. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005246588(A) 申请公布日期 2005.09.15
申请号 JP20040064248 申请日期 2004.03.08
申请人 NIKON CORP 发明人 KATO HIDEFUMI;TAKAHASHI TOSHIMASA;TAKAHASHI SATOSHI;KIMURA SATOSHI
分类号 B24B31/00;(IPC1-7):B24B31/00 主分类号 B24B31/00
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