METHOD AND APPARATUS FOR CONTROLLING DEVELOPER FOR PHOTORESIST

摘要

PROBLEM TO BE SOLVED: To provide a method and an appararutus for controlling a developer for photoresist by which practical effective developer concentration and effective dissolved resist concentration can be obtained accurately in real-time while considering effects of carbonate concentration. SOLUTION: An apparent developer concentration (TM1) and an apparent dissolved resist concentration (PR1) are calculated from the correlation between conductivity and ultrasonic propagation rate of the developer. Carbonate concentration (TMAC1) is calculated from the peak wavelength difference (δwl) obtained by spectral analysis for the absorbent of the developer and by using the correlation between the peak wavelength difference and the carbonate concentration of the developer. Effective dissolved resist concentration (PR2) and effective developer concentration (TM2) are calculated from the obtained carbonate concentration (TMAC1) while considering effects of the carbonate concentration on the dissolved resist concentration and on the developer concentration obtained, the effects which are preliminarily obtained by an experiment of blowing carbonic acid gas. COPYRIGHT: (C)2005,JPO&NCIPI