发明名称 |
Method and apparatus for processing a micro sample |
摘要 |
An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.
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申请公布号 |
US2005199828(A1) |
申请公布日期 |
2005.09.15 |
申请号 |
US20050127213 |
申请日期 |
2005.05.12 |
申请人 |
TOKUDA MITSUO;FUKUDA MUNEYUKI;MITSUI YASUHIRO;KOIKE HIDEMI;TOMIMATSU SATOSHI;SHICHI HIROYASU;KASHIMA HIDEO;UMEMURA KAORU |
发明人 |
TOKUDA MITSUO;FUKUDA MUNEYUKI;MITSUI YASUHIRO;KOIKE HIDEMI;TOMIMATSU SATOSHI;SHICHI HIROYASU;KASHIMA HIDEO;UMEMURA KAORU |
分类号 |
G01N1/32;G01N1/28;G01N23/225;G01Q10/00;G01Q30/02;G01Q30/04;G01Q30/16;G01Q30/20;H01J37/20;H01J37/256;H01J37/28;H01J37/30;H01J37/305;H01J37/317;H01L21/66;H04L29/06;H04L29/08;(IPC1-7):G21G5/00;G01N23/00 |
主分类号 |
G01N1/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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