| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method to manufacture a microfabricated object by fabricating the surface of a fluorite by chemical etching using ICP or RIE dry etching. <P>SOLUTION: Nickel layers 4 are formed by electroforming using a chromium film layer 2 being exposed by the patterning of resists 3 as an electrode (c). Then, the resists 3 are dissolved and eliminated using the nickel layers 4 as protective layers, the exposed chromium film layer 2 is eliminated by dry etching to expose the surface of a substrate 1 (d). Then, etching is conducted for the substrate 1 by dry etching of a chemical etching mode by chlorine-based gas using the nickel layers 4 as protective layers (e). When materials having deliquescence property are formed on the surface of the substrate 1, the materials are washed and eliminated by water or other methods. Then, the nickel layers 4 are dissolved and residual chromium films are dissolved employing other dissolving liquid and the objective fluorite substrate 1 on which a prescribed pattern is formed on the surface is completed (f). <P>COPYRIGHT: (C)2005,JPO&NCIPI |
